Hydrogen plasma diagnostics for advanced plasma processing

Shota Nunomura, National Institute of Advanced Industrial Science and Technology (AIST), Japan
October 26, 2017, 10:00am, EBU-II 459



In this talk, we show recent results on hydrogen plasma diagnostics for advanced plasma processing, particularly aimed for hydrogen passivation in semiconductor materials [1]. The experimental results on plasma parameters, ion species, and hydrogen atom density will be presented. The experiments were performed in capacitively coupled plasma in a gas pressure range of 10 mTorr to 10 Torr [2]. Also, the 2D fluid model simulations were performed to study the hydrogen plasma kinetics. In the talk, we would like to discuss the reaction and transport kinetics of hydrogen atoms and ions in order to control the plasma processing and also the divertor plasma in fusion reactors.

    [1] S.Nunomura et al., “Hydrogen atom kinetics in capacitively coupled hydrogen plasmas”, Plasma Sources Science and Technology 26, 55018-1~55018-8, 2017.

    [2] S. Nunomura et al.,, “Characterization of high-pressure capacitively coupled hydrogen plasmas”, Journal of Applied Physics 102, 093306-1~093306-7, 2007.



Dr. Shota Nunomura is the senior researcher of Research Center for Photovoltaic Technologies at National Institute of Advanced Industrial Science and Technology (AIST), Japan. He received his PhD in Engineering from Nagoya University. Following post-doctoral years at University of Iowa, Max-Plank Institute, and Kyushu University, he joined AIST. He held a visiting scholar appointment at Electrical Engineering and Computer Science, University of Michigan, 2013. He is now a visiting associate professor at Graduate School and Faculty of Information Science and Electrical Engineering, Kyushu University. He has published over 40 papers in the fields of basic plasma science and plasma applications. He serves on technical committees and editorial boards in various capacities. He is a member of JSAP, MRS and AVS . His research interests include basic plasma science and plasma applications for state of the art semiconductor devices. 

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